集成铁电体 SCIE

期刊简介预计审稿时间： 约3.0个月

Integrated Ferroelectrics provides an international, interdisciplinary forum for electronic engineers and physicists as well as process and systems engineers, ceramicists, and chemists who are involved in research, design, development, manufacturing and utilization of integrated ferroelectric devices. Such devices unite ferroelectric films and semiconductor integrated circuit chips. The result is a new family of electronic devices, which combine the unique nonvolatile memory, pyroelectric, piezoelectric, photorefractive, radiation-hard, acoustic and/or dielectric properties of ferroelectric materials with the dynamic memory, logic and/or amplification properties and miniaturization and low-cost advantages of semiconductor i.c. technology.

《集成铁电体》为电子工程师和物理学家以及参与集成铁电体设备研究、设计、开发、制造和利用的工艺和系统工程师、陶瓷学家和化学家提供了一个国际性的跨学科论坛。此类设备将铁电薄膜和半导体集成电路芯片结合在一起。其结果是产生了一种新型电子设备，它将铁电材料独特的非易失性存储器、热电、压电、光折变、抗辐射、声学和/或介电特性与半导体集成电路技术的动态存储器、逻辑和/或放大特性以及小型化和低成本优势相结合。

《Integrated Ferroelectrics》(集成铁电体)编辑部通讯方式为TAYLOR & FRANCIS LTD, 4 PARK SQUARE, MILTON PARK, ABINGDON, ENGLAND, OXON, OX14 4RN。如果您需要协助投稿或润稿服务，您可以咨询我们的客服老师。我们专注于期刊投稿服务十年，熟悉发表政策，可为您提供一对一投稿指导，避免您在投稿时频繁碰壁，节省您的宝贵时间，有效提升发表机率，确保SCI检索（检索不了全额退款）。我们视信誉为生命，多方面确保文章安全保密，在任何情况下都不会泄露您的个人信息或稿件内容。